Please use this identifier to cite or link to this item: https://physrep.ff.bg.ac.rs/handle/123456789/1176
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dc.contributor.authorŠtrbac, D. D.en
dc.contributor.authorLukić-Petrović, S. R.en
dc.contributor.authorPetrović, D. M.en
dc.contributor.authorVidenović, Ivanen
dc.contributor.authorDramićanin, M.en
dc.date.accessioned2022-07-12T18:33:17Z-
dc.date.available2022-07-12T18:33:17Z-
dc.date.issued2014-02-01en
dc.identifier.issn0267-0836en
dc.identifier.urihttps://physrep.ff.bg.ac.rs/handle/123456789/1176-
dc.description.abstractThe paper reports on hardness of thin amorphous films of the Cux(As38·5Se54I7·5)100-x type for x=10, 15, 20 and 25 at-% evaluated by microindentation measurements and instrumented nanoindentation testing. Values of determined microhardness are in the interval of 748-1137 MPa, while nanohardness are in the interval of 930-1591 MPa and can be regarded as moderate in the category of chalcogenide glasses. Isotropic mechanical properties on thin films surface are determined. Influence of copper on mechanical properties of As-Se-I films is discussed in terms of possible structural units in glass matrix. © 2014 Institute of Materials, Minerals and Mining.en
dc.relation.ispartofMaterials Science and Technology (United Kingdom)en
dc.subjectAmorphous chalcogenidesen
dc.subjectHardnessen
dc.subjectThin filmsen
dc.titleInfluence of copper on hardness of amorphous As-Se-I thin filmsen
dc.typeArticleen
dc.identifier.doi10.1179/1743284713Y.0000000346en
dc.identifier.scopus2-s2.0-84893085466en
dc.identifier.urlhttps://api.elsevier.com/content/abstract/scopus_id/84893085466en
dc.relation.issue2en
dc.relation.volume30en
dc.relation.firstpage236en
dc.relation.lastpage240en
item.grantfulltextnone-
item.openairetypeArticle-
item.cerifentitytypePublications-
item.openairecristypehttp://purl.org/coar/resource_type/c_18cf-
item.fulltextNo Fulltext-
crisitem.author.orcid0000-0002-4307-6473-
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